Mask having sidewall absorbers to enable the printing of...

Details Mask having sidewall absorbers to enable the printing of... Mask having sidewall absorbers to enable the printing of...

2004-01-30

2009-10-20

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07604903

ABSTRACT:
A mask is provided to be used with nanoprint lithography processes to facilitate reproduction of small features required for the production of integrated circuits. A translucent substrate is provided along with one or more three-dimensional features that include one or more vertical sidewalls. An absorbing material is deposited upon one or more of the vertical sidewalls so that light in an incident direction to an upper surface of the substrate will be absorbed by the absorbing material, resulting in light blocking features. One or more horizontal surfaces are formed upon one or more of the three-dimensional features, which allow light rays to exit a lower surface of the substrate unobstructed by the absorbing material.

REFERENCES:
patent: 4816361 (1989-03-01), Glendinning
patent: 5411824 (1995-05-01), Vasudev et al.
patent: 5530265 (1996-06-01), Takemura
patent: 5786114 (1998-07-01), Hashimoto
patent: 5994157 (1999-11-01), Aggas et al.
patent: 6020590 (2000-02-01), Aggas et al.
patent: 2003/0193068 (2003-10-01), Yeh
patent: 2006/0051974 (2006-03-01), French et al.
patent: WO 9417450 (1994-08-01), None
Grant, Roger and Claire, Grant & Hackh's Chemical Dictionary, Fifth Edition, 1987, McGraw-Hill, Inc., pp. 261 and 487.

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