Semiconductor manufacturing facility utilizing exhaust...

Gas separation – Combined or convertible – In environmental air enclosure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C055S420000, C055S424000, C055S467000, C055S485000, C055S486000, C096S417000, C096S418000, C454S187000, C454S228000, C454S230000, C454S233000, C454S236000, C422S122000, C422S177000

Reexamination Certificate

active

07485169

ABSTRACT:
A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

REFERENCES:
patent: 4050368 (1977-09-01), Eakes
patent: 4549472 (1985-10-01), Endo et al.
patent: 4693175 (1987-09-01), Hashimoto
patent: 4869734 (1989-09-01), Jacquish
patent: 5004483 (1991-04-01), Eller et al.
patent: 5090972 (1992-02-01), Eller et al.
patent: 5096477 (1992-03-01), Shinoda et al.
patent: 5350336 (1994-09-01), Chen et al.
patent: 5518528 (1996-05-01), Tom et al.
patent: 5972060 (1999-10-01), O'Halloran et al.
patent: 6080060 (2000-06-01), Larsson
patent: 6196050 (2001-03-01), Ikeda et al.
patent: 6264550 (2001-07-01), Matsumoto
patent: 6280507 (2001-08-01), Walker
patent: 6280691 (2001-08-01), Homeyer et al.
patent: 6284020 (2001-09-01), Mizuno et al.
patent: 6328776 (2001-12-01), Shanks et al.
patent: 6358139 (2002-03-01), Renz
patent: 6585192 (2003-07-01), Beers
patent: 6605134 (2003-08-01), Ishihara et al.
patent: 6641635 (2003-11-01), Chiesl
patent: 6740147 (2004-05-01), Kishkovich et al.
patent: 6749655 (2004-06-01), Dautenhahn
patent: 6749671 (2004-06-01), Holst et al.
patent: 6770117 (2004-08-01), Olander
patent: 7105037 (2006-09-01), Olander et al.
patent: 2001/0015133 (2001-08-01), Sakai et al.
patent: 2005/0005585 (2005-01-01), Kim
patent: 2005/0039425 (2005-02-01), Olander et al.
patent: 2005/0050866 (2005-03-01), Mullins
patent: 2005/0284292 (2005-12-01), Ruan

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor manufacturing facility utilizing exhaust... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor manufacturing facility utilizing exhaust..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor manufacturing facility utilizing exhaust... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4139895

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.