Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-06-22
2009-12-29
Wells, Nikita (Department: 2881)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S296000, C430S942000, C430S005000
Reexamination Certificate
active
07638247
ABSTRACT:
Optimized dose assignments are determined for each portion of a layout by utilizing an improved proximity function and additional dose correction functions in performing a short range proximity effect correction. The optimized dose assignments are determined to minimize critical dimension (CD) deviations and maintain CD linearity across different feature sizes. The improved proximity function and additional dose correction functions are determined by calibration based on experimental CD measurements of test designs. The improved proximity function includes a sum of more than two Gaussian functions, each having an associated effect range and an associated weight, wherein one or more of the associated weights may be negative. The additional dose correction functions include an iso-dense bias correction function and a dose evaluation point displacement function for line end shortening correction. The short range proximity effect correction results are provided as input to a subsequent long range proximity correction.
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S. Manakli, C. Soonekindt, L. Pain, J. Todeschini, B. Icard, B. Minghetti, “Complimentary Dose and Geometrical Solutions for EBDW Lithography Proximity Effects Correction—Application for Sub-45NM Nodes Product Manufacturing”, “Publicly Presented” (As Opposed to Published), Feb. 22, 2006, Microlithography Conference 2006, San Jose, CA.
Belic Nikola
Eisenmann Hans
PDF Solutions, Inc.
Smith Johnnie L
Wells Nikita
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