Circuit pattern exposure method and mask

Details Circuit pattern exposure method and mask Circuit pattern exposure method and mask

2007-01-03

2009-12-15

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07632614

ABSTRACT:
A circuit pattern exposure method for irradiating illumination light onto a mask to transfer (offset) mask patterns that are formed in the mask to a semiconductor substrate, wherein the mask includes a plurality of main mask patterns that are arranged at a prescribed pitch and auxiliary mask patterns that are arranged outside the outermost main mask pattern and that are not to be transferred (offset) to the semiconductor substrate; the auxiliary mask patterns are provided with a first auxiliary mask row that is arranged adjacent to the outermost main mask pattern and a second auxiliary mask row that is arranged adjacent to the first auxiliary mask row; and the first auxiliary mask row and the second auxiliary mask row are arranged at a pitch that is narrower than the pitch of arrangement of the main mask patterns.

REFERENCES:
patent: 6074787 (2000-06-01), Takeuchi
patent: 6620556 (2003-09-01), Ohsaki
patent: 04-268714 (1992-09-01), None
patent: 05-002261 (1993-01-01), None
patent: 10-186629 (1998-07-01), None
patent: 2002-116529 (2002-04-01), None
patent: 2004-272228 (2004-09-01), None

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