Pattern transfer mask, focus variation measuring method and...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S030000

Reexamination Certificate

active

07598007

ABSTRACT:
A reticle of the present invention has a main pattern (11) and a monitor pattern (12) each having a different thickness of a light-shielding film (4), the light-shielding film (4) of the monitor pattern (12) being formed thicker than that of the main pattern (11). Therefore, in a CD-focus curve, a focus center at which a focus value is the optimal value is shifted from the extremal value, so that a positive
egative direction of the focus is specified by monitoring the amount of shift using this shifted focus center. This configuration provides easy and highly accurate measurements of a focus error amount and the positive
egative direction of the focus. Ultimately, the measured focus error information is fed back to a next lot and is fed forward to a next process to manufacture a semiconductor device stably.

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