Process for producing fluorine gas

Chemistry of inorganic compounds – Halogen or compound thereof – Elemental halogen

Reexamination Certificate

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Details

C423S503000, C423S504000, C137S338000, C137S003000, C137S896000, C137S341000, C422S198000, C422S238000, C422S239000, C422S236000

Reexamination Certificate

active

07572428

ABSTRACT:
A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.

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patent: WO 2004/056700 (2004-07-01), None

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