Method of manufacturing near field light generation element

Details Method of manufacturing near field light generation element Method of manufacturing near field light generation element

2006-02-23

2009-12-22

Culbert, Roberts (Department: 1792)

Etching a substrate: processes

Forming or treating optical article

C216S011000

Reexamination Certificate

active

07635437

ABSTRACT:
A near field light generation element is manufactured by forming a truncated quadrangular pyramid on a substrate by forming an etching mask having a shape the same as but larger than that of a top face of the truncated quadrangular pyramid, and isotropic etching the substrate using the etching mask. Thereafter, metal films are formed on two opposite side faces of the truncated quadrangular pyramid by injecting a vacuum deposition source from a front of each of the faces and a direction parallel to the substrate.

REFERENCES:
patent: 09259379 (1997-10-01), None

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