Methods of fabricating active device array substrate and...

Details Methods of fabricating active device array substrate and... Methods of fabricating active device array substrate and...

2006-09-20

2009-02-03

Graybill, David E (Department: 2894)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S070000, C349S106000, C349S124000

Reexamination Certificate

active

07485483

ABSTRACT:
A method of fabricating an active device array substrate is provided. First, a substrate is provided. A pixel array is formed on the substrate. An alignment material layer having a plurality of alignment regions is formed on the pixel array. A mask layer is formed on a portion of the alignment regions on the alignment material layer by using an inkjet printing process, so as to expose another portion of the alignment regions on the alignment material layer. Then, a particle beam alignment process is performed to the exposed alignment material layer. Then, the mask layer is removed. Another mask layer is formed on the alignment material layer which has been treated by the particle beam to expose the alignment material layer not treated by the particle beam. Another particle beam alignment process is performed to the exposed alignment material layer, and then the another mask layer is removed.

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