Method of forming fine pattern, liquid crystal display...

Details Method of forming fine pattern, liquid crystal display... Method of forming fine pattern, liquid crystal display...

2006-06-13

2009-10-27

Blum, David S (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

C257SE21039

Reexamination Certificate

active

07608541

ABSTRACT:
A method of forming fine pattern includes providing a film, forming a photo-resist pattern on the film, ashing the photo-resist pattern and patterning the film by using the ashed photo-resist pattern as a mask.

REFERENCES:
patent: 6514672 (2003-02-01), Young et al.
patent: 6620690 (2003-09-01), Lee et al.
patent: 2002/0090827 (2002-07-01), Yokoshima

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