Polishing method, polishing device, glass substrate for...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S104000

Reexamination Certificate

active

07494401

ABSTRACT:
There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate1) in the shape of a circular disc having a circular hole in a center portion is polished with an abrasive liquid50containing free abrasive grains being supplied, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush4or a polishing pad in contact with the inner peripheral end surface.

REFERENCES:
patent: 1961487 (1934-06-01), Hamann
patent: 4718202 (1988-01-01), Worsham
patent: 5274959 (1994-01-01), Dyer et al.
patent: 5465475 (1995-11-01), Kinoshita et al.
patent: 5486134 (1996-01-01), Jones et al.
patent: 5514025 (1996-05-01), Hasegawa et al.
patent: 5861066 (1999-01-01), Moinpour et al.
patent: 5916656 (1999-06-01), Kitayama et al.
patent: 6036785 (2000-03-01), Ferrell
patent: 6055694 (2000-05-01), Steere
patent: 6059903 (2000-05-01), Roloff et al.
patent: 6086977 (2000-07-01), Suzuki et al.
patent: 6280294 (2001-08-01), Miyamoto
patent: 6361708 (2002-03-01), Kubo et al.
patent: 6641465 (2003-11-01), Miyamoto
patent: 08-192586 (1996-07-01), None
patent: 08-257912 (1996-10-01), None
patent: 09-102120 (1997-04-01), None
patent: 09-124343 (1997-05-01), None
patent: 09-180183 (1997-07-01), None
patent: 09-192999 (1997-07-01), None
patent: 09-314458 (1997-12-01), None
patent: 10-237426 (1998-09-01), None
patent: 11-028649 (1999-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polishing method, polishing device, glass substrate for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing method, polishing device, glass substrate for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing method, polishing device, glass substrate for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4114883

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.