Method of monitoring the manufacture of interferometric...

Details Method of monitoring the manufacture of interferometric... Method of monitoring the manufacture of interferometric...

2005-11-17

2009-11-17

Fulk, Steven J (Department: 2891)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S016000, C257S048000, C257SE21530, C359S578000

Reexamination Certificate

active

07618831

ABSTRACT:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.

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