Dual-mode electron beam column

Details Dual-mode electron beam column Dual-mode electron beam column

2005-11-17

2009-12-15

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML

Reexamination Certificate

active

07633069

ABSTRACT:
A dual-mode electron beam column (10) for selectably providing, in an electron beam lithography machine, a Gaussian beam for enhanced writing resolution and a variable shaped beam for enhanced writing throughput comprises a first aperture (13) for confining the beam, a first lens (14) for focussing the beam at a first image plane positioned in dependence on the beam mode, a beamshaping second aperture (15) positionable in the beam path in the shaped beam mode, a second lens (16) effective in the shaped beam mode to focus the beam in a second image plane, and a third aperture (17) in the second image plane to confine or shape the beam depending on mode. Variation of the shape of the shaped beam is achieved by a beam double deflector system (18) operable only in the shaped beam mode.

REFERENCES:
patent: 4263514 (1981-04-01), Reeds, Jr.
patent: 5013913 (1991-05-01), Benner
patent: 5633507 (1997-05-01), Pfeiffer et al.
patent: 5767521 (1998-06-01), Takeno et al.
patent: 6069684 (2000-05-01), Golladay et al.
patent: 6538255 (2003-03-01), Nakasuji
patent: 2001/0028037 (2001-10-01), Suzuki
patent: 2002/0043629 (2002-04-01), Benner
patent: 2003/0168616 (2003-09-01), Yabe et al.
patent: 2-232920 (1990-09-01), None

Affiliated with

Also associated with

Rating

Dual-mode electron beam column does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual-mode electron beam column, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual-mode electron beam column will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4095867