System and method for CD determination using an alignment...

Details System and method for CD determination using an alignment... System and method for CD determination using an alignment...

2006-11-15

2009-06-09

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

Dimension

Reexamination Certificate

active

07545520

ABSTRACT:
A system and method for determining parameters such as critical dimension of a patterned structure and best focus condition of a lithographic apparatus, based on measurement of the intensity of a non-zero order of light diffracted from an experimental structure. The experimental structure includes a first array of lines and partially filled spaces having a period longer than the wavelength of the diffracted light. The experimental structure also includes a second array of lines and spaces, where the second array of lines and spaces comprise the partially filled spaces.

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Milner et al., “Stepper Focus Characterization Using Diffraction from Latent Images,” Journal of Vacuum Science and Technology B, 2ndSeries, vol. 11, No. 4, pp. 1258-1266, Jul. 1993.
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