High resolution charged particle projection lens array using...

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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C250S3960ML, C250S492200

Reexamination Certificate

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07569834

ABSTRACT:
A charged particle optic apparatus for improvement in resolution of an electrostatic, multi-beam column is disclosed. The charged particle optic apparatus includes an electrostatic lens array having a first plurality of apertures and a first magnetic pole piece disposed proximate the electrostatic lens array. The first magnetic pole piece includes a second plurality of apertures. The charged particle optic apparatus also includes a second magnetic pole piece disposed proximate the electrostatic lens array such that the electrostatic lens array is between the first magnetic pole piece and the second magnetic pole piece. The second magnetic pole piece includes a third plurality of apertures. The first, second and third pluralities of apertures are aligned with each other. The charged particle optic apparatus may be implemented in a charged particle beam system.

REFERENCES:
patent: 6750455 (2004-06-01), Lo et al.
patent: 6897458 (2005-05-01), Wieland et al.
patent: 6919952 (2005-07-01), Kruit
patent: 7084414 (2006-08-01), Wieland et al.
patent: 7091504 (2006-08-01), Wieland et al.
N. William Parker, Alan D. Brodie and John H. McCoy, “A High Throughput NGL Electron Beam Direct-Write Lithography System”, Proceedings of SPIE, Emerging Lithographic Technologies IV, Jul. 2000, vol. 3997, p. 713-720.

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