Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-06-16
2009-02-24
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S597000, C257S079000, C257SE31126, C349S096000
Reexamination Certificate
active
07494834
ABSTRACT:
Method of manufacturing a transparent element including transparent electrodes, said method including the steps of:depositing over at least one part of the surface of a transparent substrate (1) a layer (2) of a conductive oxide that is also transparent, andstructuring in said conductive oxide layer (2) at least one electrode (4) connected to a contact pad (8) by a conductive path (6) by removing said oxide along the contour of the desired electrode (4, 6, 8) so as to create a trimming line (10) which will insulate the part (12) of the conductive oxide layer (2), which forms the electrode (4, 6, 8) and which is to be brought to an electric potential, from the rest (14) of the conductive oxide layer (2) which will be floating,this method being wherein at least a second trimming line (10′) is made around the first (10).
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Grupp Joachim
Poli Gian Carlo
Asulab S.A.
Griffin & Szipl, P.C.
Lindsay, Jr. Walter L
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