Interference display cell and fabrication method thereof

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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C216S041000, C216S047000, C216S049000

Reexamination Certificate

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07485236

ABSTRACT:
An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.

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