Methods of making a MEMS device by monitoring a process...

Details Methods of making a MEMS device by monitoring a process... Methods of making a MEMS device by monitoring a process...

2007-06-22

2009-08-04

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S711000, C438S710000, C438S048000, C438S050000

Reexamination Certificate

active

07569488

ABSTRACT:
Embodiments of the present invention relate to methods and systems for making a microelectromechanical system MEMS device comprising supplying an etchant to etch one or more sacrificial structures of the system in a chamber. A process parameter relating to the pressure within the chamber is monitored as a function of time to provide an indication of the extent of the etching of the one or more sacrificial structures.

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