Pattern inspection tool - method and apparatus

Details Pattern inspection tool - method and apparatus Pattern inspection tool - method and apparatus

1980-12-19

1982-12-21

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 3700

Patent

active

043651631

ABSTRACT:
This describes an automatic defect inspection system as could be applied to metallized masks or other patterns. The system causes each subfield to be individually aligned for inspection irrespective of the previous alignment of the pattern or any other sub-field. This is accomplished by scanning a preselected portion of each sub-field and adjusting the position of the scan based on the resulting signal while scanning a pre-established portion of the sub-field. In this way a portion of each sub-field is used as an alignment mark and stepping errors avoided.
Once alignment is achieved a probe, comparable to the size of the minimum defect to be detected is scanned over the sub-field with an overlapping pattern to find defects such as excessive metal, metal in improper places or points where the metal is missing.

REFERENCES:
patent: 3515877 (1970-06-01), Baxter et al.
patent: 3523495 (1970-08-01), Giedd et al.
patent: 3643098 (1972-02-01), Willis
patent: 3783228 (1974-01-01), Tarui et al.
patent: 3857041 (1974-12-01), Spicer
patent: 3908118 (1975-09-01), Micka
patent: 4264822 (1981-04-01), Ueno et al.
patent: 4286154 (1981-08-01), Okubo
"Automatic Pattern Positioning of Scanning Electron Beam Exposure", Miyauchi et al., IEEE Trans. on Electron Devices, vol. ED.-17, No. 6, Jun. 1970, pp. 450-457.
"Mask Inspection Using Electron-Beam Systems", Grobman, IBM Tech. Disclosure Bulletin, vol. 22, No. 12, May 1980, p. 5540.

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