Mask defect repairing method and semiconductor device...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S030000

Reexamination Certificate

active

07629088

ABSTRACT:
According to an aspect of the invention, there is provided a mask defect repairing method of repairing a defect caused by a foreign object on a light transmissive photomask, the method including moving the foreign object on a light transmission section of the light transmissive photomask using a manipulator, and placing the foreign object on a shielding section of the light transmissive photo mask.

REFERENCES:
patent: 6627362 (2003-09-01), Stivers et al.
patent: 6753538 (2004-06-01), Musil et al.
patent: 2003/0124312 (2003-07-01), Autumn
patent: 2004/0175631 (2004-09-01), Crocker et al.
patent: 4-237054 (1992-08-01), None
patent: 2002-62637 (2002-02-01), None
patent: 2005-84582 (2005-03-01), None
Machine Translation of JP-2005-084582 A.

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