Method for filling material separations on a surface

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Repairing

Reexamination Certificate

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Details

C205S089000, C205S103000, C205S104000, C205S148000, C205S170000

Reexamination Certificate

active

07544282

ABSTRACT:
Disclosed are a method and a device for filling material separations on the surface. In methods known in prior art, which are used for filling material separations, the substrate is often influenced in a negative manner by high processing temperatures and dissimilar additives. The inventive method overcomes said disadvantage, taking place at low temperatures and allowing the material separation to be completely filled without using dissimilar substances.

REFERENCES:
patent: 4436591 (1984-03-01), de Hek
patent: 4895625 (1990-01-01), Thoma et al.
patent: 5158653 (1992-10-01), Lashmore et al.
patent: 5660705 (1997-08-01), Michaut
patent: 6024861 (2000-02-01), Takeuchi et al.
patent: 6072313 (2000-06-01), Li et al.
patent: 7008522 (2006-03-01), Boucard et al.
patent: 3627779 (1988-02-01), None
patent: 41 11 174 (1992-10-01), None
patent: 195 48 198 (1997-07-01), None
patent: 0 622 810 (1994-11-01), None
patent: 1 241 473 (2002-09-01), None
patent: 1521130 (1978-08-01), None
patent: 2170997 (1990-07-01), None
patent: 2197393 (1990-08-01), None
patent: WO 03/006710 (2003-01-01), None

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