Devices and systems including the bit lines and bit line...

Details Devices and systems including the bit lines and bit line... Devices and systems including the bit lines and bit line...

2006-04-13

2009-12-29

Weiss, Howard (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Combined with electrical contact or lead

Of specified material other than unalloyed aluminum

C267S251000, C267S251000

Reexamination Certificate

active

07638878

ABSTRACT:
A method for forming a semiconductor device comprises forming first and second bit lines at different levels. Forming the bit lines at different levels increases processing latitude, particularly the spacing between the bit lines which, with conventional processes, may strain photolithographic limits. A semiconductor device formed using the method, and an electronic system comprising the semiconductor device, are also described.

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Search Report and Written Opinion for International Application No. PCT/US2007/009282, 14 pages, Dec. 3, 2007.

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