Process and apparatus for forming a deposited film using microwa

Details Process and apparatus for forming a deposited film using microwa Process and apparatus for forming a deposited film using microwa

1993-07-20

1995-09-12

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912142, 21912147, 219748, 20429802, 20429838, 427575, B23K 1000, H05B 906

Patent

active

054498805

ABSTRACT:
A process for forming a deposited film on a substrate by microwave plasma CVD comprises holding a substrate in a pressure-reducible reactor vessel, introducing microwave energy into the reactor vessel from at least three microwave-introducing means attached thereto for introducing the microwave energy into the reactor vessel while introducing a raw material gas into the reactor vessel, and forming plasma in the reactor vessel by the microwave energy, thereby forming a deposited film on the surface of the substrate.

REFERENCES:
patent: 3691338 (1972-09-01), Chang
patent: 4187405 (1980-02-01), Puschner et al.
patent: 4631380 (1986-12-01), Tran
patent: 4859493 (1989-08-01), Lemelson
patent: 5010276 (1991-04-01), Echizen et al.
patent: 5069928 (1991-12-01), Echizen et al.
patent: 5202095 (1993-04-01), Houchin et al.
patent: 5296784 (1994-03-01), Geisler et al.

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