Ignition control of remote plasma unit

Details Ignition control of remote plasma unit Ignition control of remote plasma unit

2006-03-28

2009-08-11

Philogene, Haissa (Department: 2821)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C134S018000, C156S345350, C315S111210, C315S111410, C438S017000

Reexamination Certificate

active

07571732

ABSTRACT:
A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the idle state is detected, igniting the remote plasma unit for cleaning the semiconductor-processing apparatus after a lapse of a given time period; (iii) detecting if the remote plasma unit is ignited in step (ii); and (iv) if the remote plasma unit is not ignited in step (ii), retrying ignition of the remote plasma unit.

REFERENCES:
patent: 7072028 (2006-07-01), Powell et al.
patent: 2006/0228473 (2006-10-01), Satoh et al.
patent: 2008/0251104 (2008-10-01), Chen et al.

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