Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1980-08-11
1982-12-21
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 66, 430 69, 430 84, 204192P, G03G 508, G03G 514
Patent
active
043650155
ABSTRACT:
An electrophotographic photosensitive member for forming a potential image utilizing the difference in voltage distribution resulting from the change in resistance of a photoconductive layer. The photosensitive member is featured in forming a high-contrast potential image by the use of amorphous silicon for the photoconductive layer.
REFERENCES:
patent: 3941593 (1976-03-01), Butement
patent: 3955976 (1976-05-01), Honjo et al.
patent: 4147667 (1979-04-01), Chevallier et al.
patent: 4225222 (1980-09-01), Kempter
Moustakas et al., Preparation of Highly Photoconductive Amorphous Silicon by rf Sputtering, Solid State Comm., vol. 23, 1977.
Thompson et al., rf Sputtered Amorphous Silicon Solar Cells, Reidel Publishing Co., 1978.
Ishihara Shunichi
Kitahara Nobuko
Kitajima Nobuo
Nishigaki Yuji
Canon Kabushiki Kaisha
Goodrow John L.
Kittle John E.
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