Surface detecting apparatus

Details Surface detecting apparatus Surface detecting apparatus

1997-06-30

1999-06-15

Kim, Robert H.

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

3562374, G01N 2188

Patent

active

059127325

ABSTRACT:
A surface inspection apparatus comprises a light source, a scan optical system having a scanning means for scanning a wafer surface in a direction of crossing the wafer by luminous flux from the light source, a moving unit for moving the wafer relatively in a direction of a prescribed angle with respect to the scanning direction, a light receiving unit having a photoelectric converter for receiving scattered lights from the wafer surface, and a signal processing unit performing the the surface inspection based on signals from the light receiving unit. The scanning means is controlled to scan the luminous flux forward and rearward. The signal processing unit performs the surface inspection based on signals of the light receiving unit in a region excluding a transition area where scan is performed from the outside of the wafer to the wafer within a forward and rearward scan region by the scanning means.

REFERENCES:
patent: 4376583 (1983-03-01), Alford et al.
patent: 5105092 (1992-04-01), Natsubori et al.
patent: 5321495 (1994-06-01), Hagiwara et al.
patent: 5422724 (1995-06-01), Kinney et al.
patent: 5581348 (1996-12-01), Miura et al.

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