Illumination optical system to be used in an exposure apparatus

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355 55, 355 67, G03B 2742, G03B 2752

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059127252

ABSTRACT:
An exposure apparatus comprises a light source for supplying light with a predetermined wavelength and an illumination optical system for guiding the light from this light source onto a mask formed with a predetermined pattern. The illumination optical system includes a plurality of light-transmitting optical members which transmit therethrough the light from the light source, while at least one of the plurality of light-transmitting optical members is comprised of fluorite. Even when the mask is irradiated with exposure light for a long period, the optical members in the illumination optical system can be prevented from deteriorating, whereby a stable exposure operation can be realized over a long period.

REFERENCES:
patent: Re34634 (1994-06-01), Konno et al.
patent: 4497015 (1985-01-01), Konno et al.
patent: 4870452 (1989-09-01), Tanimoto et al.
patent: 4905041 (1990-02-01), Aketagawa
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5448336 (1995-09-01), Shiraishi
patent: 5534970 (1996-07-01), Nakashima et al.
patent: 5636003 (1997-06-01), Tanitsu et al.
patent: 5699183 (1997-12-01), Hiraiwa et al.

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