Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2004-07-20
2009-10-06
Mariam, Daniel G (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C348S061000, C348S081000, C348S092000, C348S125000
Reexamination Certificate
active
07599545
ABSTRACT:
The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens30and a sample1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.
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Kubota Hitoshi
Maeda Shunji
Shibata Yukihiro
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Mariam Daniel G
Seth Manav
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