Method and its apparatus for inspecting defects

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C348S061000, C348S081000, C348S092000, C348S125000

Reexamination Certificate

active

07599545

ABSTRACT:
The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens30and a sample1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5444529 (1995-08-01), Tateiwa
patent: 5610683 (1997-03-01), Takahashi
patent: 5900354 (1999-05-01), Batchelder
patent: 6630996 (2003-10-01), Rao et al.
patent: 6788477 (2004-09-01), Lin
patent: 6867844 (2005-03-01), Vogel et al.
patent: 7130037 (2006-10-01), Lange
patent: 7372561 (2008-05-01), Shibata et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 06-124873 (1994-05-01), None
patent: 10-154659 (1998-06-01), None
patent: 11-063944 (1999-03-01), None
patent: 11118728 (1999-04-01), None
patent: 2000-155099 (2000-06-01), None
patent: 2001-356278 (2001-12-01), None
patent: 2002-350719 (2002-12-01), None
patent: WO 99/49504 (1999-09-01), None

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