Charged particle beam exposure system

Details Charged particle beam exposure system Charged particle beam exposure system

2005-04-29

2008-11-18

Vanore, David A. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230, C250S492300, C250S493100

Reexamination Certificate

active

07453075

ABSTRACT:
A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

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patent: 5616926 (1997-04-01), Shinada et al.
patent: 6566664 (2003-05-01), Muraki
patent: 6844550 (2005-01-01), Yin et al.
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patent: 2004/0188636 (2004-09-01), Hosada
patent: WO 01/48787 (2001-07-01), None
patent: WO 2004/081910 (2004-09-01), None

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