Seal system

Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...

Reexamination Certificate

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Details

C428S215000, C428S334000, C428S457000, C428S627000, C277S535000, C277S654000

Reexamination Certificate

active

07445854

ABSTRACT:
It is disclosed a method of deposting a seal coating and a seal system comprising at least two layers on the surface of an article. The upper or surface layer has a higher chromium activity than a bottom layer to reduce a diffusion of cobalt and the formation of cobalt oxide is reduced. The coating of invention may be heat-treated to reduce or optimize the formation of cobalt oxide to sustin the wear property.

REFERENCES:
patent: 3743556 (1973-07-01), Breton et al.
patent: 4666733 (1987-05-01), Wlodek
patent: 4789441 (1988-12-01), Foster et al.
patent: 4822248 (1989-04-01), Wertz et al.
patent: 4884820 (1989-12-01), Jackson et al.
patent: 5223332 (1993-06-01), Quets
patent: 5419976 (1995-05-01), Dulin
patent: 5453329 (1995-09-01), Everett et al.
patent: 5558758 (1996-09-01), Foster
patent: 5935407 (1999-08-01), Nenov et al.
patent: 6194086 (2001-02-01), Nenov et al.
patent: 6302318 (2001-10-01), Hasz et al.
patent: 6398103 (2002-06-01), Hasz et al.
patent: 6423432 (2002-07-01), Torigoe et al.
patent: 6503340 (2003-01-01), Gold et al.
patent: 2001/0006187 (2001-07-01), Hasz et al.
patent: 2001/0026845 (2001-10-01), Knight et al.
patent: 0484115 (1992-05-01), None
patent: 1358538 (1974-07-01), None

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