Width adjustable substrate support for plasma processing

Details Width adjustable substrate support for plasma processing Width adjustable substrate support for plasma processing

2005-09-28

2008-11-25

Cleveland, Michael (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C118S728000, C118S719000, C118S7230ER, C156S345310, C156S345430, C248S256000, C248S257000, C248S265000, C248S346070, C248S685000, C269S021000, C269S305000, C269S905000, C279S128000, C361S234000

Reexamination Certificate

active

07455735

ABSTRACT:
An electrode assembly for use in a plasma processing system that includes removable rails that are adjustable for reconfiguring the electrode to accommodate substrates of different widths. The electrode assembly includes an electrode having a plurality of first connecting members. Associated with the electrode is a plurality of rails that cooperate for supporting the substrates on the electrode. Each of the rails includes a plurality of second connecting members. Each of the second connecting members is connected detachably with one of the first connecting members for removably mounting the rails with the electrode.

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Austrian Patent Office, Search Report issued in corrresponding Austrian Application No. 200606058-6 dated Jun. 4, 2008 (4 pages).

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