Semiconductor device and its manufacture method capable of...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S773000, C438S628000

Reexamination Certificate

active

07470987

ABSTRACT:
A confronting surface of a substrate faces a first surface of a semiconductor element. Extension layers are formed on the substrate at positions facing electrodes on the semiconductor element. A levee film is disposed on one of the confronting surface and the first surface. Openings are formed through the levee film. Connection members which is filled but is not completely filled in the openings connect the electrodes and the extension layers.

REFERENCES:
patent: 5197654 (1993-03-01), Katz et al.
patent: 5227812 (1993-07-01), Watanabe et al.
patent: 5990560 (1999-11-01), Coult et al.
patent: 6169294 (2001-01-01), Biing-Jye et al.
patent: 6632028 (2003-10-01), Yang et al.
patent: 6761303 (2004-07-01), Ozawa
patent: 7072374 (2006-07-01), Matsumura
patent: 7092423 (2006-08-01), Kume et al.
patent: 7285858 (2007-10-01), Tsuchiya et al.
patent: 2001/0040290 (2001-11-01), Sakurai et al.
patent: 2003/0102570 (2003-06-01), Imasu et al.
patent: 2770717 (1998-04-01), None
patent: 2914065 (1999-04-01), None
patent: 3255281 (2001-11-01), None
patent: 3292044 (2002-03-01), None
patent: 2003-031851 (2003-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and its manufacture method capable of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and its manufacture method capable of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and its manufacture method capable of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4044724

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.