Method for producing thin conductive and semi-conductive layers

Details Method for producing thin conductive and semi-conductive layers Method for producing thin conductive and semi-conductive layers

1987-07-30

1989-06-06

Roy, Upendra

Fishing, trapping, and vermin destroying

148DIG23, 148DIG24, 148DIG83, 437 20, 437930, H01L 21265

Patent

active

048371742

ABSTRACT:
A method for producing thin conductive or semiconductive layers embedded in silicon in the manufacture of structures for integrated circuits and the like. The invention is characterized by implanting metal atoms (14) in a silicon substrate (15) to a pre-determined nominal depth, and subsequently causing the implanted metal atoms to be redistributed, to form a conductive or a semiconductive layer (16), by heat-treating the silicon substrate (15).

REFERENCES:
patent: 4096622 (1978-06-01), MacIver
patent: 4343082 (1982-08-01), Lepselter
patent: 4577396 (1986-03-01), Yamamoto et al.
Sanchez et al., in Proc. Materials Research Soc. Symp., vol. 51, 1986, pp. 439-444.
Kozicki et al., in Inst. of Physics Conf. Ser. #67, Section 3, 1983, Oxford, p. 137.
Sigmund et al., in Ion-Implantation: Ed. Ryssel et al., Springer, N.Y. 1983, p. 473.
Namvar et al., in Mat. Res. Soc. Symp. #27, 1984, Ed. Hubler et al., Elsevier, N.Y., p. 341 .
Tung et al., Appl. Phys. Letts. 48 (Mar. 1986), 635.
Campisi et al., in Mat. Res. Soc. Symp. Proc., vol. 54 (Mar. 15, 1986) pp. 7 47-752.

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