Lithographic apparatus with patterning device position...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S072000, C355S077000

Reexamination Certificate

active

07471373

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5894056 (1999-04-01), Kakizaki et al.
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6359678 (2002-03-01), Ota
patent: 6940582 (2005-09-01), Tanaka
patent: 2002/0109850 (2002-08-01), Takai et al.
patent: 1 137 054 (2001-09-01), None
patent: 9-171246 (1997-06-01), None
patent: 11-219900 (1999-08-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 98/40791 (1998-09-01), None
patent: WO 01/22480 (2001-03-01), None
European Search Report dated May 12, 2004 for EP 03077013.5.
“Photomasks with Integral Laser Mirrors and Calibration of Integral Laser Mirrors on Photomasks,”IBM Technical Disclosure Bulletin, vol. 32, No. 5b, pp. 19-21, Oct. 1, 1989.
“Improvements to lithographic projection apparatus,”Research Disclosure,Nov. 2001, pp. 1854-1856.
Japanese Official Action issued for Japanese Patent Application No. 2004-187216, dated Jul. 5, 2007.

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