Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Patent
1997-09-30
1999-05-25
Mathews, Alan A.
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
355 53, 356400, 2504431, G03B 2752
Patent
active
059073900
ABSTRACT:
Positioning accuracy of a scanning stage is improved as a result of reducing error by reducing a non-uniformity in the temperature of air on an optical path of length measurement of the stage. An apparatus for measuring the position of a reticle stage and adjusting the position of the stage based upon the results of measurement includes a reflecting mirror secured to the stage, an interferometer for measuring the distance between a reference position and the reflecting mirror using light, and an air conditioner for supplying a temperature-regulated air stream to an optical path of length measurement connecting the reference position and the reflecting mirror, the air stream being supplied at a speed higher than the speed at which the stage is scanned.
REFERENCES:
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4814625 (1989-03-01), Yabu
patent: 4969168 (1990-11-01), Sakamoto et al.
patent: 5063582 (1991-11-01), Mori et al.
patent: 5093579 (1992-03-01), Amemiya et al.
patent: 5138643 (1992-08-01), Sakamoto et al.
patent: 5141318 (1992-08-01), Miyazaki et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5220171 (1993-06-01), Hara et al.
patent: 5231291 (1993-07-01), Amemiya et al.
patent: 5281996 (1994-01-01), Bruning et al.
patent: 5469260 (1995-11-01), Takagi et al.
Canon Kabushiki Kaisha
Mathews Alan A.
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