Radiant energy – Means to align or position an object relative to a source or...
Patent
1997-05-28
1999-06-15
Anderson, Bruce
Radiant energy
Means to align or position an object relative to a source or...
2504922, H01J 37304
Patent
active
059124679
ABSTRACT:
The apparatus and methods of the present invention provide for the precise measurement and correction of pattern formation characteristics, such as the reduction factor and the rotation angle of projected images. The projected image measurement apparatus includes a projection optical system having a charged particle beam source, a mask, a mask stage, evaluation marks positioned on the mask or on the mask stage wherein such evaluation marks have set distances therebetween, a reference material defining reference marks, a device for moving the reference material, a device for detecting the amount of movement of the reference material, a device for detecting charged particle beams or reflected charged particles, a deflection system capable of shifting charged particle beams, a device for moving evaluation mark images near the reference mark, a device for ascertaining the amount of movement of the evaluation mark images during such measurements, a controller capable of calculating pattern formation characteristics from data obtained by such measurements, and a correction system for changing the image placement based on the correction data obtained and error amounts calculated. The precise position of the evaluation mark images are measured utilizing the reference marks and comparing such image positions to the actual positions of the evaluation marks on the mask. Such data are the basis for determining correction values for the pattern formation characteristics of the projection optics system.
REFERENCES:
patent: 4057347 (1977-11-01), Moriyama et al.
patent: 4469949 (1984-09-01), Mori et al.
patent: 5180919 (1993-01-01), Oae et al.
patent: 5283440 (1994-02-01), Sohda et al.
patent: 5379108 (1995-01-01), Nose
patent: 5523576 (1996-06-01), Koike et al.
patent: 5552611 (1996-09-01), Encihen
Anderson Bruce
Nikon Corporation
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