Integrated high voltage capacitor having capacitance...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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Details

C257S199000, C257S532000, C257S296000, C257SE21008, C257SE21122, C438S238000, C438S240000, C438S257000, C438S381000

Reexamination Certificate

active

07470991

ABSTRACT:
The present invention provides an integrated high voltage capacitor, a method of manufacture therefore, and an integrated circuit chip including the same. The integrated high voltage capacitor, among other features, includes a first capacitor plate (120) located over or in a semiconductor substrate (105), and an insulator (130) located over the first capacitor plate (120), at least a portion of the insulator (130) comprising an interlevel dielectric layer (135, 138, 143, or148). The integrated high voltage capacitor further includes capacitance uniformity structures (910) located at least partially within the insulator (130) and a second capacitor plate (160) located over the insulator (130).

REFERENCES:
patent: 4805071 (1989-02-01), Hutter et al.
patent: 5187637 (1993-02-01), Embree
patent: 5702988 (1997-12-01), Liang
patent: 7413947 (2008-08-01), Larkin et al.
patent: 2004/0262635 (2004-12-01), Lee
patent: 2005/0280061 (2005-12-01), Lee
patent: 2006/0186450 (2006-08-01), Larakin et al.

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