Device and method for vacuum film formation

Coating apparatus – Gas or vapor deposition – Running length work

Reexamination Certificate

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Details

C118S720000, C118S729000

Reexamination Certificate

active

07462244

ABSTRACT:
A vacuum deposition apparatus is used for deposit evaporated substance from evaporation sources (6aand6b) on the desired position of a flexible substrate (1). While the flexible substrate (1) is carried using rollers in a vacuum, shutters (8aand8b) are opened and closed to control the movement of the evaporated substance via openings. A film having a desired shape of pattern is formed on the flexible substrate (1) with higher controllability.

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