Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate
2005-03-08
2008-12-16
Sullivan, Daniel M (Department: 1621)
Semiconductor device manufacturing: process
Chemical etching
C570S134000
Reexamination Certificate
active
07465667
ABSTRACT:
The present invention is drawn to liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid perfluoro-n-alkanes of the invention are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.
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French Roger Harquail
Wheland Robert Clayton
E.I. du Pont de Nemours and Company
Katakam Sudhakar
Sullivan Daniel M
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