Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2007-07-17
2008-11-18
Nguyen, Hung Henry (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S030000
Reexamination Certificate
active
07453550
ABSTRACT:
An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, a liquid recovery mechanism which recovers the liquid on the substrate at a liquid recovery position apart from the projection area, and a trap member which is arranged outside the liquid recovery position of the liquid recovery mechanism with respect to the projection area and which is formed with a liquid trap surface for capturing the liquid.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 6788477 (2004-09-01), Lin
patent: 6867844 (2005-03-01), Vogel et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0118184 (2004-06-01), Violette
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0169834 (2004-09-01), Richter et al.
patent: 2004/0169924 (2004-09-01), Flagello et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.
patent: 2004/0180299 (2004-09-01), Rolland et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Maria Derksen et al.
patent: 2004/0224265 (2004-11-01), Endo et al.
patent: 2004/0224525 (2004-11-01), Endo et al.
patent: 2004/0227923 (2004-11-01), Flagello et al.
patent: 2004/0253547 (2004-12-01), Endo et al.
patent: 2004/0253548 (2004-12-01), Endo et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0259008 (2004-12-01), Endo et al.
patent: 2004/0259040 (2004-12-01), Endo et al.
patent: 2004/0263808 (2004-12-01), Sewell
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0036121 (2005-02-01), Hoogendam et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0036184 (2005-02-01), Yeo et al.
patent: 2005/0036213 (2005-02-01), Mann et al.
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2005/0042554 (2005-02-01), Dierichs et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0073670 (2005-04-01), Carroll
patent: 2005/0084794 (2005-04-01), Meagley et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0117224 (2005-06-01), Shafer et al.
patent: 2005/0122497 (2005-06-01), Lyons et al.
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134815 (2005-06-01), Van Santen et al.
patent: 2005/0141098 (2005-06-01), Schuster
patent: 2005/0145803 (2005-07-01), Hakey et al.
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0146695 (2005-07-01), Kawakami
patent: 2005/0147920 (2005-07-01), Lin et al.
patent: 2005/0153424 (2005-07-01), Coon
patent: 2005/0158673 (2005-07-01), Hakey et al.
patent: 2005/0164502 (2005-07-01), Deng et al.
patent: 2005/0174549 (2005-08-01), Duineveld et al.
patent: 2005/0175776 (2005-08-01), Streefkerk et al.
patent: 2005/0175940 (2005-08-01), Dierichs
patent: 2005/0185269 (2005-08-01), Epple et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0190455 (2005-09-01), Rostalski et al.
patent: 2005/0217135 (2005-10-01), O'Donnell et al.
patent: 2005/0217137 (2005-10-01), Smith et al.
patent: 2005/0217703 (2005-10-01), O'Donnell
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2005/0263068 (2005-12-01), Hoogendam et al.
patent: 2005/0270505 (2005-12-01), Smith
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 060 729 (1982-09-01), None
patent: A 57-153433 (1982-09-01), None
patent: A-57-153433 (1982-09-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-19912 (1984-02-01), None
patent: A 62-65326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-5-62877 (1993-03-01), None
patent: A-6-124873 (1994-05-01), None
patent: A 6-124873 (1994-05-01), None
patent: A 07-220990 (1995-08-01), None
patent: A-8-316125 (1996-11-01), None
patent: A 10-255319 (1998-09-01), None
patent: 10303114 (1998-11-01), None
patent: A 10-303114 (1998-11-01), None
patent: A 10-340846 (1998-12-01), None
patent: A 11-176727 (1999-07-01), None
patent: A 2000-58436 (2000-02-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 01/27978 (2001-04-01), None
patent: WO 02/13194 (2002-02-01), None
patent: WO 02/091078 (2002-11-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/077154 (2004-09-01), None
patent: WO 2004/081666 (2004-09-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/001432 (2005-01-01), None
patent: WO 2005/003864 (2005-01-01), None
patent: WO 2005/006026 (2005-01-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/013008 (2005-02-01), None
patent: WO 2005/015283 (2005-02-01), None
patent: WO 2005/017625 (2005-02-01), None
patent: WO 2005/019935 (2005-03-01), None
patent: WO 2005/022266 (2005-03-01), None
patent: WO 2005/024325 (2005-03-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/034174 (2005-04-01), None
patent: WO 2005/054953 (2005-06-01), None
patent: WO 2005/054955 (2005-06-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
patent: WO 2005/059645 (2005-06-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/062128 (2005-07-01), None
patent: WO 2005/064400 (2005-07-01), None
patent: WO 2005/064405 (2005-07-01), None
patent: WO 2005/069055 (2005-07-01), None
patent: WO 2005/069078 (2005-07-01), None
patent: WO 2005/069081 (2005-07-01), None
patent: WO 2005/071491 (2005-08-01), None
patent: WO 2005/074606 (2005-08-01), None
patent: WO 2005/076084 (2005-08-01), None
patent: WO 2005/081030 (2005-09-01), None
patent: WO 2005/081067 (2005-09-01), None
Emerging Lithographic Technologies VI, Proceedings of SPIE, vol. 4688 (2002), “Semiconductor Foundry, Lithography, and Partners”, B.J. Lin, pp. 11-24.
Optical Microlithography XV, Proceedings of SPIE, vol. 4691 (2002), “Resolution Enhancement of 157 nm Lithography by Liquid Immersion”, M. Switkes et al., pp. 459-465.
J. Microlith., Microfab., Microsyst., vol. 1 No. 3, Oct. 2002, Society of Photo-Optical Instrumentation Engineers, “Resolution enhancement of 157 nm lithography by liquid immersion”, M. Switkes et al., pp. 1-4.
Nikon Corporation, 3rd157 nm symposium, Sep. 4, 2002, “Nikon F2 Exposure Tool”, Soichi Owa et al., 25 pages (slides 1-25).
Nikon Corporation, Immersion Lithography Workshop, Dec. 11, 2002, 24 pages (slides 1-24).
Optical Microlithography XVI, Proceedings of SPIE vol. 5040 (2003), “Immersion lithography; its potential pe
Nagasaka Hiroyuki
Nishii Yasugumi
Owa Soichi
Nguyen Hung Henry
Nikon Corporation
Oliff & Berridg,e PLC
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