Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2006-09-25
2008-11-11
Nguyen, Kiet T (Department: 2881)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
07450215
ABSTRACT:
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.
REFERENCES:
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 5892572 (1999-04-01), Nishi
patent: 6394109 (2002-05-01), Somekh
patent: 6582496 (2003-06-01), Cheng et al.
patent: 6724460 (2004-04-01), Van Schaik et al.
patent: 6828569 (2004-12-01), Van Schaik et al.
patent: 2002/0057423 (2002-05-01), Nogawa
patent: 2003/0035087 (2003-02-01), Murayama
patent: 2005/0017198 (2005-01-01), Van Der Net et al.
patent: 2005/0041226 (2005-02-01), Tanaka et al.
patent: 2005/0048220 (2005-03-01), Mertens et al.
patent: 0 571 997 (1993-12-01), None
patent: 0 678 321 (1995-10-01), None
patent: 1 489 462 (2004-12-01), None
patent: 1 571 698 (2005-09-01), None
patent: 1 628 163 (2006-02-01), None
patent: 2001-358055 (2001-12-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/010619 (2005-02-01), None
Singapore Written Opinion issued for Singapore Patent Application No. 200600932-8, dated Jun. 26, 2007.
Van Bragt Erik Johannus Josephus
Van Der Net Antonius Johannes
ASML Netherlands B.V.
Nguyen Kiet T
Pillsbury Winthrop Shaw & Pittman LLP
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