Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2006-01-25
2008-11-04
Mathews, Alan A (Department: 2851)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000, C355S077000
Reexamination Certificate
active
07446851
ABSTRACT:
In a lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system having a member extending along at least part of the boundary of the space, wherein the member has a liquid inlet which faces the substrate.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 6954256 (2005-10-01), Flagello et al.
patent: 7075616 (2006-07-01), Derksen et al.
patent: 7098991 (2006-08-01), Nagasaka et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0118184 (2004-06-01), Violette
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0169834 (2004-09-01), Richter et al.
patent: 2004/0169924 (2004-09-01), Flagello et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.
patent: 2004/0180299 (2004-09-01), Rolland et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2004/0224265 (2004-11-01), Endo et al.
patent: 2004/0224525 (2004-11-01), Endo et al.
patent: 2004/0227923 (2004-11-01), Flagello et al.
patent: 2004/0253547 (2004-12-01), Endo et al.
patent: 2004/0253548 (2004-12-01), Endo et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0259008 (2004-12-01), Endo et al.
patent: 2004/0259040 (2004-12-01), Endo et al.
patent: 2004/0263808 (2004-12-01), Sewell
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0036121 (2005-02-01), Hoogendam et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0036184 (2005-02-01), Yeo et al.
patent: 2005/0036213 (2005-02-01), Mann et al.
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0073670 (2005-04-01), Carroll
patent: 2005/0084794 (2005-04-01), Meagley et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0117224 (2005-06-01), Shafer et al.
patent: 2005/0122497 (2005-06-01), Lyons et al.
patent: 2005/0141098 (2005-06-01), Schuster
patent: 2005/0190455 (2005-09-01), Rostalski et al.
patent: 2005/0217135 (2005-10-01), O'Donnell et al.
patent: 2005/0217137 (2005-10-01), Smith et al.
patent: 2005/0217703 (2005-10-01), O'Donnell
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 605 103 (1994-07-01), None
patent: 0 834 773 (1998-04-01), None
patent: A-57-153433 (1982-09-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-19912 (1984-02-01), None
patent: A-62-65326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-5-62877 (1993-03-01), None
patent: A-5-304072 (1993-11-01), None
patent: A-6-124873 (1994-05-01), None
patent: A-6-168866 (1994-06-01), None
patent: A-7-220990 (1995-08-01), None
patent: A-8-316125 (1996-11-01), None
patent: A-10-255319 (1998-09-01), None
patent: A-10-303114 (1998-11-01), None
patent: A-10-340846 (1998-12-01), None
patent: A-11-176727 (1999-07-01), None
patent: A-2000-58436 (2000-02-01), None
patent: WO99/49504 (1999-09-01), None
patent: WO 02/091078 (2002-11-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 03/085708 (2003-10-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/077154 (2004-09-01), None
patent: WO 2004/081666 (2004-09-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/001432 (2005-01-01), None
patent: WO 2005/003864 (2005-01-01), None
patent: WO 2005/006026 (2005-01-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/013008 (2005-02-01), None
patent: WO 2005/015283 (2005-02-01), None
patent: WO 2005/017625 (2005-02-01), None
patent: WO 2005/019935 (2005-03-01), None
patent: WO 2005/022266 (2005-03-01), None
patent: WO 2005/024325 (2005-03-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/034174 (2005-04-01), None
patent: WO 2005/054953 (2005-06-01), None
patent: WO 2005/054955 (2005-06-01), None
patent: WO 2005/062128 (2005-07-01), None
Emerging Lithographic Technologies VI, Proceedings of SPIE, vol. 4688 (2002), “Semiconductor Foundry, Lithography, and Partners”, B.J. Lin, pp. 11-24.
Optical Microlithography XV, Proceedings of SPIE, vol. 4691 (2002), “Resolution Enhancement of 157 nm Lithography by Liquid Immersion”, M. Switkes et al., pp. 459-465.
J. Microlith., Microfab., Microsyst., vol. 1 No. 3, Oct. 2002, Society of Photo-Optical Instrumentation Engineers, “Resolution enhancement of 157 nm lithography by liquid immersion”, M. Switkes et al., pp. 1-4.
Nikon Corporation, Litho Forum, Jan. 28, 2004, “Update on 193 nm immersion exposure tool”, S. Owa et al., 51 pages (slides 1-51).
Nikon Corporation, Immersion Lithography Workshop, Dec. 11, 2002, 24 pages (slides 1-24).
Nikon Corporation, Immersion Workshop, Jan. 27, 2004, “Update on 193 nm immersion exposure tool”, S. Owa et al., 38 pages (slides 1-38).
Nikon Corporation, 3rd157 nm symposium, Sep. 4, 2002, “Nikon F2 Exposure Tool”, Soichi Owa et al., 25 pages (slides 1-25).
Optical Microlithography XVI, Proceedings of SPIE vol. 5040 (2003), “Immersion lithography; its potential performance and issues”, Soichi Owa et al., pp. 724-733.
Nikon Corporation, NGL Workshop, Jul. 10, 2003, :Potential performance and feasibility of immersion lithography, Soichi Owa et al., 33 pages, slides 1-33.
Mathews Alan A
Nikon Corporation
Oliff & Berridg,e PLC
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