Method for generating an artificially patterned substrate...

Nanotechnology – Manufacture – treatment – or detection of nanostructure – Shaping or removal of materials

Reexamination Certificate

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C117S058000, C117S068000, C359S577000

Reexamination Certificate

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07459614

ABSTRACT:
It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystal growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.

REFERENCES:
patent: 6645677 (2003-11-01), Sandstrom
patent: 6882477 (2005-04-01), Schattenburg et al.
patent: 0 997 780 (2000-05-01), None
patent: WO 01/92293 (2001-12-01), None
patent: WO 02/42731 (2002-05-01), None
Chen et al., 50-nm x-ray lithography using synchrotron radiation, Journal of Vacuum Science technology B, vol. 12, Iss. 6, p. 3959-3964, 1994.
Yang X M et al: “Guide self-assembly of symmetric diblock copolymer films in chemically nanopatterned substrates”; Macromolecules, American Chemical Society Easton PA,US; Dec. 26, 2000; XP002223275; pp. 9575-9297; ISSN: 0024-9297.

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