Mask blank and mask for electron beam exposure

Details Mask blank and mask for electron beam exposure Mask blank and mask for electron beam exposure

2005-05-31

2008-11-04

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07445875

ABSTRACT:
A mask blank for electron beam exposure includes a pattern support layer that transmits an electron beam therethrough, an electron beam scattering layer formed on the pattern support layer, and a support body supporting the pattern support layer and the electron beam scattering layer. The pattern support layer is formed by a material that has an amorphous structure and that is mainly composed of carbon-silicon bonds. The pattern support layer is a tensional stress membrane that has a surface roughness of 0.2 (nm, Rms) or less. A mask for electron beam exposure is formed by patterning the electron beam scattering layer of the mask blank.

REFERENCES:
patent: 5260151 (1993-11-01), Berger et al.
patent: 5466904 (1995-11-01), Pfeiffer et al.
patent: 5935739 (1999-08-01), Bayer et al.
patent: 5972794 (1999-10-01), Katakura
patent: 6812473 (2004-11-01), Amemiya
patent: 7201726 (1995-08-01), None
patent: 10260523 (1998-09-01), None
patent: 10261584 (1998-09-01), None
patent: 10321495 (1998-12-01), None
patent: 2001077013 (2001-03-01), None
Berger et al., “New approach to projection-electron lithography with demonstrated 0.1 μm linewidth,” Appl. Phys. Letters 57 (2), Jul. 9, 1990, pp. 153-155.
Bohlen et al., “High Throughout Submicron Lithography with Electron Beam Proximity Printing,” Solid State Technology, Sep. 1984, pp. 210-214.

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