Fluorinated vinyl ethers, copolymers thereof, and use in...

Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C568S616000, C568S649000, C568S674000, C568S685000

Reexamination Certificate

active

07465837

ABSTRACT:
Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I)wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

REFERENCES:
patent: 4513128 (1985-04-01), Uschold
patent: 6232417 (2001-05-01), Rhodes et al.
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6509134 (2003-01-01), Ito et al.
patent: 6548219 (2003-04-01), Ito et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 6908724 (2005-06-01), Araki et al.
patent: 7150957 (2006-12-01), DiPietro et al.
patent: 2002/0048724 (2002-04-01), Harada et al.
patent: 2002/0051936 (2002-05-01), Harada et al.
patent: 2002/0058199 (2002-05-01), Zampini et al.
patent: 2002/0146639 (2002-10-01), Brock et al.
patent: 2002/0160297 (2002-10-01), Fedynyshyn et al.
patent: 2002/0160303 (2002-10-01), Kim et al.
patent: 2002/0164538 (2002-11-01), Allen et al.
patent: 2003/0091928 (2003-05-01), Choi
patent: 2003/0211417 (2003-11-01), Fryd et al.
patent: 2003/0235781 (2003-12-01), Shida et al.
patent: 2002220416 (2002-08-01), None
Abstract of Jp 2002220416. Aug. 9, 2002.
Machine English language translation of Jp 2002220416. Aug. 9, 2002.
U.S. Appl. No. 10/090,646, filed Sep. 11, 2003, Breyta et al.
U.S. Appl. No. 10/091,373, filed Oct. 2, 2003, Ito.
Choi et al., (2000) “Design and Synthesis of New Materials for ArF Lithography,” inAdvances in Resist Technology, F. Houlihan, Ed., Proceedings of SPIE 3999.
Fujigaya et al., (2002) “A New Photoresist Material for 157 nm Lithography-2,”Journal of Photopolymer Science and Technology, 15(4):643-654.
Ito et al. (1982), “Polymerization of Methyl α-(Trifluoromethyl)acrylate and α-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacrylate,”Macromolecules15:915.
Ito et al. (1984),“Radical Reactivity and Q-e Values of Methyl α-(Trifluoromethyl)-acrylate,”Macromolecules17:2204.
Ito et al. (1987), “Anionic Polymerization of α-(Trifluoromethyl)Acrylate,” inRecent Advances in Anionic Polymerization, T. E. Hogen-Esch and J. Smid, Eds. (Elsevier Science Publishing Co., Inc.).
Kunz et al., “Outlook for 157-nm Resist Design,” SPIE Conference on Advances in Resist Technology and Processing XVI, Santa Clara, CA (Mar. 1999).
Okimoto et al. (2002), “Development of a Highly Efficient Catalytic Method for Synthesis of Vinyl Ethers,”J. Am. Chem. Soc. 124(8):1590-1591.
Watanabe et al. (1957), “Homogenous Metal Salt Catalysis in Organic Reactions. I. The Preparation of Vinyl Ethers by Vinyl Transetherification,”J. Am. Chem. Soc. 79:2828-2833.
Willison et al. (1983), “Poly(methyl α-Trifluoromethylacrylate) as a Positive Electron Beam Resist,”Polymer Engineering and Science23(18):1000-1003.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluorinated vinyl ethers, copolymers thereof, and use in... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorinated vinyl ethers, copolymers thereof, and use in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorinated vinyl ethers, copolymers thereof, and use in... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4020769

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.