Exposure apparatus and method for manufacturing device

Details Exposure apparatus and method for manufacturing device Exposure apparatus and method for manufacturing device

2007-09-21

2008-12-09

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07463331

ABSTRACT:
An exposure apparatus used to expose a substrate includes an optical system which includes two optical elements and which is configured to guide light emitted from a light source to the substrate, gas supply sections configured to supply gas to a space between the optical elements, and gas exhaust sections configured to exhaust the gas from the space. The gas is supplied to the space such that a swirl flow is formed in the space.

REFERENCES:
patent: 5907390 (1999-05-01), Sakamoto
patent: 6496246 (2002-12-01), Spinali
patent: 6853439 (2005-02-01), Hase
patent: 6970228 (2005-11-01), Aoki et al.
patent: 11-145053 (1999-05-01), None
patent: 2005-183624 (2005-07-01), None

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