Method and apparatus for inspecting a pattern

Details Method and apparatus for inspecting a pattern Method and apparatus for inspecting a pattern

2007-06-12

2008-10-14

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500, C382S145000

Reexamination Certificate

active

07436507

ABSTRACT:
An apparatus for inspecting a fine pattern with a simple configuration is provided. The apparatus mainly comprises a scanning unit for scanning a surface of the pattern using a light spot, a reflection detecting unit for detecting one of the light beams having been separated from a light beam reflected at the pattern and outputting a first light intensity signal, an astigmatism detecting unit for creating a second light intensity signal including a phase information on the other light beam having been separated, and an image processing unit for creating an inspection result of the pattern based on the first and second light intensity signals.

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patent: 2002-519667 (2002-07-01), None
patent: 2002-287327 (2002-10-01), None

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