Conductive compositions and processes for use in the...

Compositions – Electrically conductive or emissive compositions – Free metal containing

Reexamination Certificate

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Reexamination Certificate

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07435361

ABSTRACT:
The present invention is directed to a thick film conductive composition comprising: (a) electrically conductive silver powder; (b) zinc-containing additive; (c) glass frit wherein said glass frit is lead-free; dispersed in (d) organic medium. The present invention is further directed to an electrode formed from the composition above wherein said composition has been fired to remove the organic vehicle and sinter said glass particles. Still further, the invention is directed to a method of manufacturing a semiconductor device from a structural element composed of a semiconductor having a p-n junction and an insulating film formed on a main surface of the semiconductor comprising the steps of (a) applying onto said insulating film the thick film composition detailed above; and (b) firing said semiconductor, insulating film and thick film composition to form an electrode. Additionally, the present invention is directed to a semiconductor device formed by the method detailed above and a semiconductor device formed from the thick film conductive composition detailed above.

REFERENCES:
patent: 4256513 (1981-03-01), Yoshida et al.
patent: 4737197 (1988-04-01), Nagahara et al.
patent: 5645765 (1997-07-01), Asada et al.
patent: 2002/0005507 (2002-01-01), Matsumoto
patent: 2004/0104262 (2004-06-01), Mears
patent: 2004/0155227 (2004-08-01), Bechtloff et al.
patent: 2004/0214016 (2004-10-01), Adachi
patent: 2006/0001009 (2006-01-01), Garreau-Iles et al.
patent: 2006/0231801 (2006-10-01), Carroll et al.
patent: 11-330512 (1999-11-01), None
patent: 2001-015782 (2001-01-01), None
patent: 2001-127317 (2001-05-01), None
patent: 2001-313400 (2001-11-01), None
patent: 2003-223813 (2003-08-01), None
patent: 2004-146521 (2004-05-01), None

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