Lithographic apparatus and method for calibrating the same

Details Lithographic apparatus and method for calibrating the same Lithographic apparatus and method for calibrating the same

2007-07-09

2008-08-05

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

Position or displacement

Position transverse to viewing axis

Reexamination Certificate

active

07408655

ABSTRACT:
Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

REFERENCES:
patent: 3957378 (1976-05-01), Zipin
patent: 4203064 (1980-05-01), Suzuki et al.
patent: 4215938 (1980-08-01), Farrand et al.
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 6285444 (2001-09-01), Osanai et al.
patent: 6285457 (2001-09-01), Ukaji
patent: 6686991 (2004-02-01), Binnard et al.
patent: 6868354 (2005-03-01), Kosuge et al.
patent: 2002/0041380 (2002-04-01), Kwan
patent: 2003/0179357 (2003-09-01), Ravensbergen
patent: 2004/0051881 (2004-03-01), Holzapfel et al.
patent: 2004/0263846 (2004-12-01), Kwan
patent: 2005/0168714 (2005-08-01), Renkens et al.
patent: 2006/0023178 (2006-02-01), Loopstra et al.
patent: 1 182 509 (2002-02-01), None
patent: 1 400 855 (2004-03-01), None
Singapore Patent Office Communication—Invitation to Respond to Written Opinion dated Aug. 14, 2006.
Australian Written Opinion and Search Report mailed Jul. 6, 2006.
European Search Report issued for European Patent Application No. 05076665.8-2222, dated Feb. 10, 2006.

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