Method of extracting locations of nucleic acid array features

Image analysis – Applications – Biomedical applications

Reexamination Certificate

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Reexamination Certificate

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07412085

ABSTRACT:
Methods for correcting systematic errors in the measured position of deposited features of a nucleic acid array on a substrate. Systematic errors are modeled by an algorithmic model based on measuring the positions (and possibly other properties) of a subset of the features, and a model is constructed for predicting deviations in feature position from an ideal grid. Deviations arising in the deposition process, the scanning process, or both may be corrected.

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A. Kulkin et al., Title: “High Throughput Screening Of Gene Expression Signatures”, 2000, Genetica 108, pp. 41-46.
R.C.Y. Cheung & Christopher J.S. deSilva, “Analysis Of Gene Microarray Images”, 1999, IEEE, pp. 627-632.

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