Manufacturing system error detection

Details Manufacturing system error detection Manufacturing system error detection

1997-02-26

1999-05-25

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430394, 430296, G03C 500

Patent

active

059069023

ABSTRACT:
The present invention relates to a method for determining error in a manufacturing system by providing a substrate having first pattern disposed thereon. An energy source such as electromagnetic radiation or particle beams is projected through a shaping member having a second pattern incongruent with the first pattern to form a shaped energy source. The shaped energy source impinges on the first pattern such that a portion of said shaped energy source is reflected, scattered, or transmitted by the first pattern. The portion of the shaped energy source that is reflected, scattered or transmitted by the first pattern is detected to determine the presence or absence of an error in the manufacturing system.
In a further aspect, the present invention relates to a method for constructing an error detection system. A waveform representative of at least one manufacturing system parameter is selected. Associated with the waveform is a mathematical function. The function is expanded in a set of orthogonal functions to yield coefficients which are used to construct an error detection pattern.

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